AST210/ EE213 - Soft X-rays and Extreme Ultraviolet Radiation
AST210/ EE213 - Soft X-rays and Extreme Ultraviolet Radiation (Fall 2005, UC Berkeley). Instructor: Professor David Attwood. This course covers topics: electromagnetics at short wavelengths, particularly soft X-ray and extreme ultraviolet radiation, X-ray optics, the generation of coherent radiation at EUV and soft X-ray wavelengths, and applications to microscopy and lithography.
Lecture 01 - Introduction, Part A |
Lecture 02 - Introduction, Part B |
Lecture 03 - X-ray Interaction with Matter |
Lecture 04 - Radiation by an Accelerated Charge; Scattering |
Lecture 05 - X-ray Scattering by a Multi-Electron Atom, Wave Equation and Refractive Index |
Lecture 06 - Wave Equation and Refractive Index |
Lecture 07 - Brewster's Angle, Multilayer Interface Coating |
Lecture 08 - Multilayer Applications |
Lecture 09 - Synchrotron Radiation |
Lecture 10 - Bending Magnet Radiation, Undulator Radiation |
Lecture 11 - Undulator Radiation |
Lecture 12 - Spectral Brightness of Undulator Radiation, Undulator Harmonics |
Lecture 13 - Plasma Physics |
Lecture 14 - Plasma physics (cont.) |
Lecture 15 - Plasma Waves |
Lecture 16 - Blackbody Radiation |
Lecture 17 - High Harmonic Generation |
Lecture 18 - Lasers |
Lecture 19 - EUV and Soft X-ray Lasers |
Lecture 20 - Laser Wavelength Scaling |
Lecture 21 - Coherence, Spatial and Temporal |
Lecture 22 - Coherent Undulator Radiation |
Lecture 23 - van Cittert-Zernike Theorem |
Lecture 24 - Coherence, Zone Plate Formulas |
Lecture 25 - Diffraction by Zone Plates and Pinholes, Resolution |
Lecture 26 - DOF, Zone Plates Diffraction, Coherence Issues |
Lecture 27 - Applications of Zone Plate Microscopy |
Lecture 28 - EUV Lithography |
References |
Soft X-ray and EUV Radiation
Soft X-Rays and Extreme Ultraviolet Radiation. Instructor: Professor David Attwood. Co-listed at UC Berkeley as AST210 and EECS 213. Lecture Material Used in Class.
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